Silicide films for archival optical storage

King-Ning Tu*, K. Y. Ahn, S. R. Herd

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

11 Scopus citations

Abstract

We demonstrate here that bilayer films consisting of Si and transition metals with a layer thickness of 15-40 nm are promising materials for archival optical storage. They show a large optical reflectivity change before and after silicide formation, have a long lifetime at room temperature, and are nontoxic.

Original languageEnglish
Pages (from-to)927-929
Number of pages3
JournalApplied Physics Letters
Volume39
Issue number11
DOIs
StatePublished - 1 Dec 1981

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