Shape-optimized electrooptic beam scanners: Analysis, design, and simulation

Yi Chiu, Jie Zou, Daniel D. Stancil, T. E. Schlesinger

Research output: Contribution to journalArticlepeer-review

41 Scopus citations

Abstract

This paper presents the analysis of a general nonrectangular clectrooptic (EO) scanner and compare its performance to a rectangular device. Since the scanning sensitivity of an EO scanner is inversely proportional to its width, high sensitivity requires the device contour to be close to the ray trajectory of a beam propagating through the device. Accordingly, a shaped-optimized scanner is designed so that the beam trajectory at maximum deflection is parallel to the device contour. A beam propagation method (BPM) simulation shows the performance agrees well with the analysis.

Original languageEnglish
Pages (from-to)108-113
Number of pages6
JournalJournal of Lightwave Technology
Volume17
Issue number1
DOIs
StatePublished - 1 Dec 1999

Keywords

  • BPM simulation
  • Electrooptic (EO) scanner
  • Ray equation
  • Ray tracing
  • Scanning sensitivity

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