Selective growth of carbon nanotube on scanning probe tips by microwave plasma chemical vapor deposition

Fu-Ming Pan*, Y. B. Liu, Edward Yi Chang, C. Y. Chen, T. G. Tsai, M. N. Chang, Jeng-Tzong Sheu

*Corresponding author for this work

Research output: Contribution to journalArticle

4 Scopus citations

Abstract

Selective growth of carbon nanotube on scanning probe tips was investigated using microwave plasma chemical vapor deposition (MPCVD). A local electric field induced oxidation (EFIO) method was used to define the cobalt catalyst domain on the tip apex of a commercial silicon based atomic force microscope (AFM). It was observed that wet etching effectively removed the oxidized TiN cap layer from the tip apex which was used to produce cobalt catalyst domain. High resolution atomic force microscopy images of a silica trench pattern were also demonstrated using the carbon nanotube tip.

Original languageEnglish
Pages (from-to)90-93
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume22
Issue number1
DOIs
StatePublished - 1 Jan 2004

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