RF performance limitation of high-k AlTiOx and Al2O3 gate dielectrics

Albert Chin, S. B. Chen, K. T. Chan, J. C. Hsieh, M. H. Chang, C. C. Lin, J. Liu, K. M. Chen

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Scopus citations

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Chemical Compounds

Engineering & Materials Science