RF noise characteristics of high-k AlTiO x and Al 2 O 3 gate dielectrics

S. B. Chen*, C. H. Huang, Albert Chin, J. Lin, J. P. Jou, K. C. Su, J. Liu

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

16 Scopus citations

Abstract

We have characterized the radio frequency (rf) noise in high-k Al 2 O 3 and AlTiO x gate dielectrics, which have respective effective oxide thickness (EOT) of 17.2 and 12.5 Å. The measured noise figure in gate dielectric is material dependent and sensitive to dielectric defect after stress. Although the high-k AlTiO x gate dielectric has lower EOT, it has a higher noise figure than others. From the simulation in our proposed equivalent circuit model, the dominant noise is thermal noise and the reason for increasing noise figure after stress is due to additional parallel resistance by trap-assisted tunneling.

Original languageEnglish
JournalJournal of the Electrochemical Society
Volume149
Issue number7
DOIs
StatePublished - 1 Jul 2002

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