Reoxidation behavior of high-nitrogen oxynitride films after O2 and N2O treatment

Bo Chun Lin*, Kow-Ming Chang, Chiung Hui Lai, Kuang Yeu Hsieh, June Min Yao

*Corresponding author for this work

Research output: Contribution to journalArticle

1 Scopus citations

Abstract

Reoxidation of a high-nitrogen ultrathin oxynitride (∼1.3nm) has been studied. The reoxidation is conducted using an alternation of nitrous oxide and oxygen gas in rapid thermal oxidation (RTO). The new finding in this study is the zig-zag characteristic of the oxidation rate by O2 and N 2O. It is clear that the N2O oxidation rate is almost independent of the concentration of nitrogen in oxynitride through out the rapid thermal oxidation process, but the O2 oxidation rate is not.

Original languageEnglish
Pages (from-to)2993-2994
Number of pages2
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume44
Issue number5 A
DOIs
StatePublished - 1 May 2005

Keywords

  • Atomic oxygen
  • Nitrous oxide
  • Oxynitride
  • Rapid thermal oxidation
  • Zig-zag

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