Relatively low temperature growth of carbon nanotubes by thermal chemical vapor deposition using novel catalysts

Han Chung Tai*, Kao Chao Lin, Tsung Ying Chuang, Yao Ren Chang, Rui Ling Lai, Jiun Kai Shiu, Huang-Chung Cheng

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We found out the promising catalyst materials(NiPd). The NiPd not only has the low melting point but also has the Pd enhancing the surface diffusion at low temperatures(<500′c ). With the Pd film thickness increasing, we could control the CNT density and synthesize more aligned and uniform CNTs. We also obtained the better electrical properties including lower turn-on field (3.4 V/um) and higher current density (34.3 mA/cm2) for NiPd as catalyst. For the advantages described above, we believe that the difficulty of low temperature on FED can be overcome. Further, the large area field emission display might be fabricated in the future.

Original languageEnglish
Title of host publicationOrganic and Inorganic Nanotubes
Subtitle of host publicationFrom Molecular to Submicron Structures
Pages61-69
Number of pages9
DOIs
StatePublished - 1 Dec 2006
Event2006 MRS Spring Meeting - San Francisco, CA, United States
Duration: 17 Apr 200621 Apr 2006

Publication series

NameMaterials Research Society Symposium Proceedings
Volume922
ISSN (Print)0272-9172

Conference

Conference2006 MRS Spring Meeting
CountryUnited States
CitySan Francisco, CA
Period17/04/0621/04/06

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    Tai, H. C., Lin, K. C., Chuang, T. Y., Chang, Y. R., Lai, R. L., Shiu, J. K., & Cheng, H-C. (2006). Relatively low temperature growth of carbon nanotubes by thermal chemical vapor deposition using novel catalysts. In Organic and Inorganic Nanotubes: From Molecular to Submicron Structures (pp. 61-69). (Materials Research Society Symposium Proceedings; Vol. 922). https://doi.org/10.1557/PROC-0922-U07-16