Relative stabilities of tetramethyl orthosilicate and tetraethyl orthosilicate in the gas phase

Jason C.S. Chu, James Breslin, Niann-Shiah Wang, Ming-Chang Lin*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

29 Scopus citations

Abstract

The stabilities of Si(OCH3)4 and Si(OC2H5)4 have been studied pyrolytically using highly diluted mixtures near atmospheric-pressure conditions. FTIR spectrometric analyses of the disappearance of the reactants and the formation of various major stable products allow us to qualitatively account for the global difference in the measured overall first-order decay constants: TMOS is significantly more stable than TEOS. The mechanistic implication of these results is discussed.

Original languageEnglish
Pages (from-to)179-184
Number of pages6
JournalMaterials Letters
Volume12
Issue number3
DOIs
StatePublished - 1 Jan 1991

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