Relation between the plasma characteristics and physical properties of functional zinc oxide thin film prepared by radio frequency magnetron sputtering process

Che Wei Hsu, Tsung Chieh Cheng, Wen Hsien Huang, Jong-Shinn Wu*, Cheng Chih Cheng, Kai Wen Cheng, Shih Chiang Huang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

21 Scopus citations

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