Recessed metal/silicon contact resistance measured by the cross-bridge-kelvin resistor structure-Numerical analysis

Bing-Yue Tsui, Mao Chieh Chen

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations
Original languageEnglish
Title of host publicationSMS 1993 Technical Digest - 1993 Symposium on Semiconductor Modeling and Simulation
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages99-100
Number of pages2
ISBN (Electronic)0780312252, 9780780312258
DOIs
StatePublished - 1 Jan 1993
Event1993 Symposium on Semiconductor Modeling and Simulation, SMS 1993 - Taipei, Taiwan
Duration: 6 Mar 19937 Mar 1993

Publication series

NameSMS 1993 Technical Digest - 1993 Symposium on Semiconductor Modeling and Simulation

Conference

Conference1993 Symposium on Semiconductor Modeling and Simulation, SMS 1993
CountryTaiwan
CityTaipei
Period6/03/937/03/93

Cite this

Tsui, B-Y., & Chen, M. C. (1993). Recessed metal/silicon contact resistance measured by the cross-bridge-kelvin resistor structure-Numerical analysis. In SMS 1993 Technical Digest - 1993 Symposium on Semiconductor Modeling and Simulation (pp. 99-100). [664574] (SMS 1993 Technical Digest - 1993 Symposium on Semiconductor Modeling and Simulation). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/SMS.1993.664574