Reactions of some [C, N, O]-containing molecules with Si surfaces: Experimental and theoretical studies

Xin Lu*, Ming-Chang Lin

*Corresponding author for this work

Research output: Contribution to journalReview article

125 Scopus citations

Abstract

Mechanistic understanding of the reactions of small molecules containing C, N and O with Si surfaces is not only fundamentally interesting but also practically important to the development of SiC, SiN, SiO, SiCN and diamond thin films. This article reviews the recent experimental and theoretical work on the reactions of a dozen of [C, N, O]-containing molecules with single-crystal surfaces of Si, including N precursors (ammonia (NH3), hydrazine (N2H4) and hydrazoic acid (HN3)), CO-containing molecules (carbon monoxide (CO), formaldehyde (CH2O), acetaldehyde (CH3CHO), formic acid (HCOOH), methanol (CH3OH) and ketene (CH2CO)), CN-containing molecules (hydrogen cyanide (HCN), cyanogen (C2N2), acetonitrile (CH3CN) and methylhydrazine (CH3N2H3)), a CNO-containing molecule (formamide (NH2CHO)) and some aromatic heterocyclic compounds (pyrrole (C4H5N), thiophene (C4H4S), furan (C4H4O), pyridine (C5H5N), pyrazine (C4H4N2) and s-triazine (C3H3N3)).

Original languageEnglish
Pages (from-to)137-184
Number of pages48
JournalInternational Reviews in Physical Chemistry
Volume21
Issue number1
DOIs
StatePublished - 1 Jan 2002

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