Reaction of silane with atomic oxygen at high temperatures

Daisuke Iida, Mitsuo Koshi*, Hiroyuki Matsui

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

4 Scopus citations

Abstract

The reaction of silane with atomic oxygen (3P) was investigated by the shock-tube-laser-photolysis method over the temperature range of 900-1170 K. Oxygen atoms were produced by the ArF laser photolysis of SO2 behind reflected shock waves and monitored with atomic resonance absorption spectroscopy. The rate constant for the SiH4 + O reaction was evaluated by taking the possible contribution of the consecutive reaction into consideration. The Arrhenius temperature coefficient was determined to be Ea = 26.6 kJ mol-1, which is much higher than the experimental activation energies obtained at lower temperatures. Rate constants calculated by a transition state theory with the reaction barrier height of E0 = 10.2 kJ mol-1 agreed well with both the present and the previous experimental results for a wide temperature range.

Original languageEnglish
Pages (from-to)285-291
Number of pages7
JournalIsrael Journal of Chemistry
Volume36
Issue number3
DOIs
StatePublished - 1 Jan 1996

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