Properties of polycrystalline diamond as X-ray mask

Jeng-Tzong Sheu*, G. Y. Yang, B. R. Huang

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

2 Scopus citations

Abstract

1.5 μm thick polycrystalline diamond film was deposited using microwave plasma chemical vapor deposition (MPCVD) as x-ray mask membrane with 0.1 to approximately 0.25 μm seeding. The temperature is controlled between 820 to 830 degree Celsius and the ratios of CH4/H2 gas mixtures are varied for the quality and stress of the diamond film. The optical properties and radiation damage of the membrane will be demonstrated. Low tensile stress diamond membrane has been formed with backside KOH etching. Surface morphology was monitored by the AFM and the quality of the diamond film was measured by the Raman spectroscopy.

Original languageEnglish
Pages (from-to)173-175
Number of pages3
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume3512
DOIs
StatePublished - 1 Dec 1998
EventProceedings of the 1998 Conference on Materials and Device Characterization in Micromachining - Santa Clara, CA, USA
Duration: 21 Sep 199822 Sep 1998

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