Process technology - Gate stack process I - Fundamental aspects

Albert Chin*, Stefan De Gendt

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

Original languageEnglish
Article number4418937
Number of pages1
JournalTechnical Digest - International Electron Devices Meeting, IEDM
DOIs
StatePublished - 1 Dec 2007
Event2007 IEEE International Electron Devices Meeting, IEDM - Washington, DC, United States
Duration: 10 Dec 200712 Dec 2007

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