Process technology - Advanced gatestack and dielectrics

Min Yang*, Albert Chin

*Corresponding author for this work

Research output: Contribution to journalEditorial

Original languageEnglish
Article number4154439
JournalTechnical Digest - International Electron Devices Meeting, IEDM
DOIs
StatePublished - 1 Dec 2006
Event2006 International Electron Devices Meeting, IEDM - San Francisco, CA, United States
Duration: 10 Dec 200613 Dec 2006

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