Process and characteristics of modified Schottky barrier (MSB) p-channel FinFETs

Bing-Yue Tsui*, Chia Pin Lin

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

24 Scopus citations

Abstract

A novel modified Schottky barrier p-channel FinFET (MSB FinFET) has been successfully demonstrated previously. In this paper, the detailed process conditions, especially the formation of MSB junctions, has been presented. Device characteristics as well as the geometry effect are also discussed extensively. In the MSB FinFETs fabricated by the two-step silicidation and implant-to-silicide techniques (ITS), an ultrashort and defect-free source/drain extension (SDE) could be formed at a temperature as low as 600 °C, resulting in excellent electrical characteristics. The ultrashort SDE could effectively thin out the SB width between source/channel during on-state or broaden and elevate it between drain/channel during off-state. A leakage mechanism of MSB FinFETs similar to the conventional ones was identified by the activation energy analysis. Strong fin width dependence of the electrical characteristics was also found in the proposed devices. When the fin width becomes larger than the silicide grain size, the multigrain structure results in a rough front edge of the MSB junction, which in turn degrades the short-channel device performance. This result indicates that the MSB device is suitable for use as FinFET. The low thermal budget of the MSB FinFET relaxes the thermal stability issue for metal gate/high-κ dielectric integration. It is considered that the proposed MSB FinFET is a very promising nanodevice.

Original languageEnglish
Pages (from-to)2455-2462
Number of pages8
JournalIEEE Transactions on Electron Devices
Volume52
Issue number11
DOIs
StatePublished - 1 Nov 2005

Keywords

  • FinFET
  • Implant-to-silicide (ITS)
  • Schottky barrier (SB)
  • Silicon-on-insulator (SOI)

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