Porous materials with ultra-low dielectric constant as antireflective coating layers for F 2 and ArF lithography

H. L. Chen, C. W. Tu, T. J. Wang, Po-Tsun Liu, Fu-Hsiang Ko, T. C. Chung

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

In this paper, optical characteristics of porous MSQ were measured for BARC applications. Optical constants of porous MSQ are (1.432, 0.004) and (1.245, 0.454) at 193 and 157 nm, respectively. For 157 nm, the porous MSQ film has suitable optical characteristics as a BARC layer.

Original languageEnglish
Title of host publicationDigest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages122-123
Number of pages2
ISBN (Electronic)4891140402, 9784891140403
DOIs
StatePublished - 1 Jan 2003
EventInternational Microprocesses and Nanotechnology Conference, MNC 2003 - Tokyo, Japan
Duration: 29 Oct 200331 Oct 2003

Publication series

NameDigest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003

Conference

ConferenceInternational Microprocesses and Nanotechnology Conference, MNC 2003
CountryJapan
CityTokyo
Period29/10/0331/10/03

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