Plasma process induced damage in sputtered TiN metal gate capacitors with ultra-thin nitrided oxide

C. C. Chen*, Horng-Chih Lin, C. Y. Chang, Tien-Sheng Chao, S. C. Huang, W. F. Wu, T. Y. Huang, M. S. Liang

*Corresponding author for this work

Research output: Contribution to conferencePaperpeer-review

5 Scopus citations

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Engineering & Materials Science