Plasma beam alignment technique was applied to enhance the alignment ability and EO properties of LC devices. The alignment defects of FLC device were suppressed by asymmetric hybrid cell with plasma and rubbing pre-treatment PI substrates. And the oxygen plasma post-treatment was adopted for alignment preparation in Ar plasma alignment process. The light leakage at the dark state of TN device was suppressed by the new treatment. The NEXAFS data suggested that the out of plane carbonyl groups have been regenerated under oxygen plasma after-treatment. The cell's EO properties by new plasma treatment were comparable to the rubbed PI surface.
|State||Published - 1 Dec 2009|
|Event||2009 International Display Manufacturing Conference, 3D Systems and Applications, and Asia Display, IDMC/3DSA/Asia Display 2009 - Taipei, Taiwan|
Duration: 27 Apr 2009 → 30 Apr 2009
|Conference||2009 International Display Manufacturing Conference, 3D Systems and Applications, and Asia Display, IDMC/3DSA/Asia Display 2009|
|Period||27/04/09 → 30/04/09|