Plasma alignment technology for liquid crystal devices

Chi Wen Lin*, Chin Yi Hsu, Huang-Ming Chen, Chin Yang Lee, Yin Chang Lin, Yao Jane Hsu

*Corresponding author for this work

Research output: Contribution to conferencePaperpeer-review

2 Scopus citations

Abstract

Plasma beam alignment technique was applied to enhance the alignment ability and EO properties of LC devices. The alignment defects of FLC device were suppressed by asymmetric hybrid cell with plasma and rubbing pre-treatment PI substrates. And the oxygen plasma post-treatment was adopted for alignment preparation in Ar plasma alignment process. The light leakage at the dark state of TN device was suppressed by the new treatment. The NEXAFS data suggested that the out of plane carbonyl groups have been regenerated under oxygen plasma after-treatment. The cell's EO properties by new plasma treatment were comparable to the rubbed PI surface.

Original languageEnglish
StatePublished - 1 Dec 2009
Event2009 International Display Manufacturing Conference, 3D Systems and Applications, and Asia Display, IDMC/3DSA/Asia Display 2009 - Taipei, Taiwan
Duration: 27 Apr 200930 Apr 2009

Conference

Conference2009 International Display Manufacturing Conference, 3D Systems and Applications, and Asia Display, IDMC/3DSA/Asia Display 2009
CountryTaiwan
CityTaipei
Period27/04/0930/04/09

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