Planarized silver interconnect technology with A Ti self-passivation technique for deep sub-micron ULSIs

Y. Ushiku, H. Ono, T. Iijima, N. Ninomiya, A. Nishiyama, H. Iwai, H. Hara

Research output: Contribution to journalConference article

9 Scopus citations
Original languageEnglish
Article number760278
Pages (from-to)121-122
Number of pages2
JournalDigest of Technical Papers - Symposium on VLSI Technology
DOIs
StatePublished - 1993
Event1993 13th Symposium on VLSI Technology, VLSIT 1993 - Kyoto, Japan
Duration: 17 May 199319 May 1993

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