Photothermal conversion dynamics in femtosecond and picosecond discrete laser etching of Cu-phthalocyanine amorphous film analysed by ultrafast UV-VIS absorption spectroscopy

Yoichiroh Hosokawa*, Masaki Yashiro, Tsuyoshi Asahi, Hiroshi Masuhara

*Corresponding author for this work

Research output: Contribution to journalArticle

59 Scopus citations

Abstract

Novel etching of Cu-phthalocyanine (CuPc) amorphous film which is characteristic of ultrashort laser irradiation was successfully confirmed by tuning Ti:Sapphire laser (780nm) to 150fs, 250ps, or 100ns, and the primary processes were investigated by fs pump-fs probe and ps pump-fs probe spectroscopic measurements. In the fs and ps laser ablation, we have found discrete laser etching in that the etch depth becomes constant and is independent of laser fluence above the ablation threshold, although gradual (normal) etching, in which the etch depth increase continuously with the fluence above ablation threshold, was observed in the ns laser ablation. The transient absorption spectral measurements reveal the nonlinear photothermal conversion processes, corresponding to exciton-exciton annihilation and cyclic multiphotonic absorption. Their time evolutions during and after the excitation pulse duration were considered and elucidated to depend strongly on the excitation pulse width. On the basis of these results, we discuss an ablation mechanism for the ps and fs ablation that the temperature elevation bringing about transient high pressure is responsible for discrete etching.

Original languageEnglish
Pages (from-to)197-207
Number of pages11
JournalJournal of Photochemistry and Photobiology A: Chemistry
Volume142
Issue number2-3
DOIs
StatePublished - 14 Sep 2001

Keywords

  • Cu-phthalocyanine
  • Discrete etching
  • Femtosecond laser ablation
  • Photothermal conversion
  • Transient absorption spectroscopy

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