Photothermal ablation of polystyrene film by 248 NM excimer laser irradiation: A mechanistic study by time-resolved measurements

Yasuyuki Tsuboi, Shin Ichi Sakashita, Koji Hatanaka, Hiroshi Fukumura, Hiroshi Masuhara*

*Corresponding author for this work

Research output: Contribution to journalArticle

26 Scopus citations

Abstract

Laser ablation mechanism at 248 nm irradiation of polystyrene film was investigated and discussed. An ablation threshold was determined by etch depth measurement and nanosecond photographic observation. Temperature at the threshold was evaluated to be 370 °C by using an effective absorption coefficient which was confirmed by transmission measurement of the excitation pulse. The temperature was in good agreement with that of thermal degradation of the polymer, showing that 248 nm ahlation of polystyrene was brought about by a photothermal process. Nanosecond photography upon the ablation could be well interpreted from the photothermal viewpoint. Moreover, dynamics of excited species revealed by nanosecond time-resolved luminescence measurements was inferred in relation to the ablation.

Original languageEnglish
Pages (from-to)167-177
Number of pages11
JournalLaser Chemistry
Volume16
Issue number3
DOIs
StatePublished - 1 Jan 1996

Keywords

  • Excimer laser ablation
  • Photothermal mechanism
  • Polystyrene
  • Time-resolved photography
  • Time-resolved spectroscopy

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