Photodissociation thresholds of OH from CH3OH in solid Ne and Ar were determined via photolysis of CH3OH/Ne and CH3OH/Ar (1/200) samples in situ at 4 K. The samples were irradiated with VUV synchrotron radiation after dispersion by a Seya-Nainioka monochromator. The OH photo-product was detected by means of laser-induced fluorescence technique. The increase of fluorescent intensity of OH was monitored and recorded after the matrix sample was irradiated at different wavelengths for 3-5 min. Photodissociation threshold energies of 7.13 ± 0.02 eV (174.0 ± 0.5nm) and 7.08 ± 0.04eV (175.0 ± 1.0nm) were measured for OH production of CH3OH in solid Ne and Ar, respectively.
|Number of pages||4|
|Journal||Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment|
|Issue number||PART II|
|State||Published - 1 Jan 2001|
- Matrix isolation
- Photodissociation threshold