Photodissociation thresholds of OH produced from CH3OH in solid neon and argon

Bing Ming Cheng*, Chin Ping Liu, Wen Jui Lo, Yuan-Pern Lee

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

9 Scopus citations

Abstract

Photodissociation thresholds of OH from CH3OH in solid Ne and Ar were determined via photolysis of CH3OH/Ne and CH3OH/Ar (1/200) samples in situ at 4 K. The samples were irradiated with VUV synchrotron radiation after dispersion by a Seya-Nainioka monochromator. The OH photo-product was detected by means of laser-induced fluorescence technique. The increase of fluorescent intensity of OH was monitored and recorded after the matrix sample was irradiated at different wavelengths for 3-5 min. Photodissociation threshold energies of 7.13 ± 0.02 eV (174.0 ± 0.5nm) and 7.08 ± 0.04eV (175.0 ± 1.0nm) were measured for OH production of CH3OH in solid Ne and Ar, respectively.

Original languageEnglish
Pages (from-to)1461-1464
Number of pages4
JournalNuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
Volume467-468
Issue numberPART II
DOIs
StatePublished - 1 Jan 2001

Keywords

  • Hydroxyl
  • Matrix isolation
  • Methanol
  • Photodissociation threshold

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