Photocatalytic behavior of salicylic acid modified TiO 2 for degradation of Bisphenol A

Su-Min Chang*, Chen Tuan Chang

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review


In this study, we modified the commercial P25 TiO 2 with salicylic acid through a microwave-assisted method. In addition, the photocatalytic behavior of the surface modified TiO 2 for degradation of bisphenol A (BPA) was examined and the role of the organic modifier on the photocatalysis was clarified. The TGA result indicates that the modified TiO 2 contained 2-3% wt of salicylic acid on the surface. Moreover, the FTIR spectra show that C=O stretching absorption of the salicylic acid red-shift from 1658 to 1609 cm -1 . This result reveals that the organic carbon was chemically bonded to surface of TiO 2 throuth complexation. The modified TiO 2 performed 2.96-fold increases in the kinetic rate constant of the unmodified P25. Dark adsorption reveals that the modified TiO 2 exhibited a high affinity toward BPA under a partition coefficient of 0.15 l/mg. The high adsorption capacity was due to the p-p interaction between salicylic acid and BPA. In addition, the EPR results show that more oxygenated radicals were stabilized in the modified TiO 2 because salicylic acid withdrew the electrons from conduction band of TiO 2 to its aromatic ring through conjugation. The combination effects of surface enrichment for target compounds and inhibited charge recombination resulted in the improved photocatalytic activity of the modified TiO 2 .

Original languageEnglish
Title of host publicationAmerican Chemical Society - 238th National Meeting and Exposition, ACS 2009, Abstracts of Scientific Papers
StatePublished - 1 Dec 2009
Event238th National Meeting and Exposition of the American Chemical Society, ACS 2009 - Washington, DC, United States
Duration: 16 Aug 200920 Aug 2009

Publication series

NameACS National Meeting Book of Abstracts
ISSN (Print)0065-7727


Conference238th National Meeting and Exposition of the American Chemical Society, ACS 2009
CountryUnited States
CityWashington, DC

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