Performance evaluation of a water mist system in semiconductor wet bench fires

Wen Yao Chang, Ping Kun Fu, Chiun-Hsun Chen, Yi Liang Shu*

*Corresponding author for this work

Research output: Contribution to journalArticle

3 Scopus citations

Abstract

Wet benches are typically utilized in semiconductor facilities for wafer and parts cleaning. Heaters and some flammable liquids, such as acetone and isopropyl alcohol (IPA), are employed during the cleaning process. Wet bench fires have caused serious losses in the semiconductor industry. To assess the fire protection performance, several field tests were performed using a water mist system installed in the wet bench. In this study, acetone pan fuel was used as fire source. The test parameters were operational pressure, pan size, nozzle location, cylinder obstruction and degree of door closure. An appropriate design for operating pressure and the location of water mist nozzles extinguished wet bench fires effectively in the early fire stages. The nozzles are suggested to be fixed above or on the each side of the pan, ensuring that mist can completely cover a pan surface with sufficient momentum. With this suggested design, fires can be extinguished in the pan and do not spread over the wet bench.

Original languageEnglish
Pages (from-to)213-218
Number of pages6
JournalProcess Safety and Environmental Protection
Volume86
Issue number3
DOIs
StatePublished - 1 May 2008

Keywords

  • Fire
  • Semiconductor
  • Water mist
  • Wet bench

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