Patterning of self-assembled nanoparticles by electron-beam lithography with chemically amplified resists

C. I. Kuo, H. L. Chen, Ying-hao Chu, F. K. Liu, Fu-Hsiang Ko, T. C. Chu

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

In this paper, patterning of self-assembled nanoparticles by using a shaped electron-beam exposure system with commercial chemically amplified resists (CAR) was demonstrated.

Original languageEnglish
Title of host publicationDigest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages224-225
Number of pages2
ISBN (Electronic)4891140402, 9784891140403
DOIs
StatePublished - 1 Jan 2003
EventInternational Microprocesses and Nanotechnology Conference, MNC 2003 - Tokyo, Japan
Duration: 29 Oct 200331 Oct 2003

Publication series

NameDigest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003

Conference

ConferenceInternational Microprocesses and Nanotechnology Conference, MNC 2003
CountryJapan
CityTokyo
Period29/10/0331/10/03

Fingerprint Dive into the research topics of 'Patterning of self-assembled nanoparticles by electron-beam lithography with chemically amplified resists'. Together they form a unique fingerprint.

Cite this