Past, present, and future of high-k/metal gate technologies

Hiroshi Iwai*

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

2 Scopus citations

Abstract

In this paper, past, present, and future of high-k/metal gate stack technologies are described, at the occasion of the workshop for the memory of late Prof. Samares Kar who initiated an ECS symposium on "Physics and Technology of High-k Gate Dielectrics" in 2002, at the 202nd ECS meeting held in Salt Lake City, Utah.

Original languageEnglish
Title of host publicationECS Transactions
EditorsDurga Misra, Stefan De Gendt, Michel Housa, Koji Kita, Dolf Landheer
PublisherElectrochemical Society Inc.
Pages3-16
Number of pages14
Edition1
ISBN (Electronic)9781607685395
DOIs
StatePublished - 2017
Event15th Symposium on Semiconductors, Dielectrics, and Metals for Nanoelectronics: In Memory of Samares Kar - 232nd ECS Meeting - National Harbor, United States
Duration: 1 Oct 20175 Oct 2017

Publication series

NameECS Transactions
Number1
Volume80
ISSN (Print)1938-6737
ISSN (Electronic)1938-5862

Conference

Conference15th Symposium on Semiconductors, Dielectrics, and Metals for Nanoelectronics: In Memory of Samares Kar - 232nd ECS Meeting
CountryUnited States
CityNational Harbor
Period1/10/175/10/17

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