Oxide breakdown model for very low voltages

Klaus F. Schuegraf, Chen-Ming Hu

Research output: Contribution to journalConference article

5 Scopus citations
Original languageEnglish
Article number760236
Pages (from-to)43-44
Number of pages2
JournalDigest of Technical Papers - Symposium on VLSI Technology
DOIs
StatePublished - 1 Jan 1993
Event1993 13th Symposium on VLSI Technology, VLSIT 1993 - Kyoto, Japan
Duration: 17 May 199319 May 1993

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