Organic thermal mode photoresists for applications in nano-lithography

Hsiu Wen Wu, Ming Chia Li, Chin Tien Yang, Chung Ta Cheng, Shuen Chen Chen, Der-Ray Huang*

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

2 Scopus citations

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Chemical Compounds

Engineering & Materials Science

Physics & Astronomy