Organic thermal mode photoresists for applications in nano-lithography

Hsiu Wen Wu, Ming Chia Li, Chin Tien Yang, Chung Ta Cheng, Shuen Chen Chen, Der-Ray Huang*

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

2 Scopus citations

Abstract

A new technology called thermal mode lithography for developing new thermal mode photoresists with temperature sensitive characteristics has been investigated. In this study, we synthesized four types of polymethine compounds that can be applied to thermal mode photoresists. The photo UV absorption and thermal properties are the important characteristics of thermal mode photoresists. The decomposition and gasification mechanisms of thermal photoresists can be analyzed by thermal properties. The surface morphology of nano-patterns can be controlled by using different laser power exposure on thermal photoresists. A cost effective way to achieve submicron or nano-structure patterns is possible.

Original languageEnglish
Title of host publicationMaterials Processing and Interfaces
PublisherMinerals, Metals and Materials Society
Pages663-668
Number of pages6
ISBN (Print)9781118296073
DOIs
StatePublished - 1 Jan 2012
Event141st Annual Meeting and Exhibition, TMS 2012 - Orlando, FL, United States
Duration: 11 Mar 201215 Mar 2012

Publication series

NameTMS Annual Meeting
Volume1

Conference

Conference141st Annual Meeting and Exhibition, TMS 2012
CountryUnited States
CityOrlando, FL
Period11/03/1215/03/12

Keywords

  • Nano-lithography
  • Submicron pattern
  • Thermal photoresists

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