A new technology called thermal mode lithography for developing new thermal mode photoresists with temperature sensitive characteristics has been investigated. In this study, we synthesized four types of polymethine compounds that can be applied to thermal mode photoresists. The photo UV absorption and thermal properties are the important characteristics of thermal mode photoresists. The decomposition and gasification mechanisms of thermal photoresists can be analyzed by thermal properties. The surface morphology of nano-patterns can be controlled by using different laser power exposure on thermal photoresists. A cost effective way to achieve submicron or nano-structure patterns is possible.