Optomechanical model of surface micromachined tunable optoelectronic devices

Chien-Chung Lin*, Wayne A. Martin, James S. Harris

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

10 Scopus citations

Abstract

Linewidth is a critical performance parameter for many optoelectronic devices. We have developed a combined optical and mechanical simulation tool and demonstrate its application to micromachined vertical-cavity tunable optoelectronic devices. The deformation of the mirror surface is calculated from the area moment method. The optical field distribution is calculated by the Fox-Li method, and the diffraction losses are estimated from second-order perturbation theory. By comparison to experimental results, we find that the deformation of the central plate is well predited by our theory. While deformation can be a major source of linewidth broadening in MEMS tunable optoelectronic devices, it is not the primary source in our devices.

Original languageEnglish
Pages (from-to)80-87
Number of pages8
JournalIEEE Journal on Selected Topics in Quantum Electronics
Volume8
Issue number1
DOIs
StatePublished - Jan 2002

Keywords

  • Cavity resonators
  • Integrated optoelectronics
  • Micromachining
  • Modeling
  • Optical diffraction
  • Optical losses
  • Perturbation methods

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