A dynamic dispatching rule is proposed in the present work to improve the performance of reducing the average cycle time and cycle time variation in a wafer fabrication factory. The dynamic dispatching rule is an extension from the four-factor bi-objective nonlinear fluctuation smoothing rule (4f-biNFS) by dynamically adjusting the factors in 4f-biNFS in a Pareto optimization manner. In addition, the radical transition among successive rules is smoothed by circulating rules of the same type through their weighted geometric mean as an intermediary rule. We have also investigated some theoretical properties of the dynamic dispatching rule. Through validating the effectiveness of the dynamic dispatching rule with a simulated case, some evidences were found to support its effectiveness, from which we also derived several directions that can be exploited in the future.
|Number of pages||7|
|Journal||International Review on Computers and Software|
|State||Published - 1 May 2011|
- Dispatching rule
- Fluctuation smoothing
- Wafer fabrication