Optical properties of surface micromachining with randomly distributed etch holes

Chung-Hao Tien*, Chi Hung Lee

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

Optical micromachining or microelectromechanical systems (MEMS) typically require etch holes to reduce the time required to release the micromechanical structure during the sacrificial undercutting. However, high-order diffraction beams generated by the periodic etch-hole array often deteriorate the optical performance by generating noise and erroneous crosstalk signals in most optical systems. In this study, we examined the diffraction from a perforated micromirror and proposed a random distributed etch-hole layout. Due to the superposition of cosine functions with random periods, noise caused by high-order beams can be averaged effectively.

Original languageEnglish
Pages (from-to)1015-1017
Number of pages3
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume45
Issue number2 A
DOIs
StatePublished - 8 Feb 2006

Keywords

  • Diffraction
  • Etch holes
  • MEMS

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