Optical-gradient type of antireflective coatings for sub-70 nm optical lithography applications

H. L. Chen, Wonder Fan, T. J. Wang, Fu-Hsiang Ko, R. S. Zhai, C. K. Hsu, T. J. Chuang

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

We demonstrate an optical-gradient bottom antireflective coating film, which is prepared by a silicon nitride film treated with oxygen plasma. Results indicate that the optical-gradient type film is suitable for sub-70 nm optical lithography applications.

Original languageEnglish
Title of host publicationCLEO/Pacific Rim 2003 - 5th Pacific Rim Conference on Lasers and Electro-Optics
Subtitle of host publicationPhotonics Lights Innovation, from Nano-Structures and Devices to Systems and Networks, Proceedings
PublisherInstitute of Electrical and Electronics Engineers Inc.
Number of pages1
ISBN (Electronic)0780377664
DOIs
StatePublished - 1 Jan 2003
Event5th Pacific Rim Conference on Lasers and Electro-Optics, CLEO/Pacific Rim 2003 - Taipei, Taiwan
Duration: 15 Dec 200319 Dec 2003

Publication series

NamePacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest
Volume2

Conference

Conference5th Pacific Rim Conference on Lasers and Electro-Optics, CLEO/Pacific Rim 2003
CountryTaiwan
CityTaipei
Period15/12/0319/12/03

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