Optical-gradient antireflective coatings for 157-nm optical lithography applications

Hsuen Li Chen*, Wonder Fan, Tzyy Jyann Wang, Fu-Hsiang Ko, Run Sheng Zhai, Chien Kui Hsu, Tung Jung Chuang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

We demonstrate an optical-gradient bottom antireflective coating (BARC) film, which can be easily prepared by treating a silicon nitride film with oxygen plasma. The oxygen composition is gradually decreased inside the silicon nitride film. The optical constants of the silicon nitride film are also changed gradually. A reflectance of less than 1% for various highly reflective substrates with high thickness-controlled tolerance has been achieved. The optical-gradient film is also shown to have high thermal stability during the postexposure bake procedure. Results indicate that the optical-gradient-type BARC is suitable in both ArF and F 2 excimer lasers for sub-70-nm lithography applications.

Original languageEnglish
Pages (from-to)2141-2145
Number of pages5
JournalApplied Optics
Volume43
Issue number10
DOIs
StatePublished - 1 Apr 2004

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