On the Profile Design and Optimization of Epitaxial Si and SiGe-Base Bipolar Technology for 77 K Applications—Part II: Circuit Performance Issues

John D. Cressler, Emmanuel F. Crabbé, James H. Comfort, Johannes M. Stork, Jack Y.C. Sun

Research output: Contribution to journalArticlepeer-review

45 Scopus citations

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Chemical Compounds

Engineering & Materials Science