Off-axis unbalanced magnetron sputtering of YBa2Cu3O7 thin films

Wen Chou Tsai, Tseung-Yuen Tseng*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

An unbalanced magnet assembly is used in DC off-axis sputtering to grow YBa2Cu3O7 superconducting thin films. The assembly with a stronger central magnet than the annular magnet directs plasma to bombard the off-axis substrate, resulting in deteriorated thin films. In contrast, the assembly with a weaker central magnet directs plasma away from the off-axis substrate and results in a film with a higher transition temperature and a smoother surface. Furthermore, the latter type of unbalanced DC magnetron sputtering gives a higher deposition rate and enables the grown film to be uniform in composition on static substrates over a range of 8 cm in length. These results reveal the feasibility of using the unbalanced magnetron for thin film growth.

Original languageEnglish
Pages (from-to)229-233
Number of pages5
JournalMaterials Chemistry and Physics
Volume49
Issue number3
DOIs
StatePublished - Jul 1997

Keywords

  • Sputtering
  • Thin films
  • Unbalanced magnetron
  • YBCO

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