Odorous VOC removal by TiO 2 photocatalysts under UV and visible light

Hsun-Ling Bai, Chienchih Chen, Chungliang Chang, Walter Den

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

TiO 2 based photocatalysts were produced with the plasma assisted method at 1 atm. The photocatalytic particles were used to decompose toluene and isopropanol. Results of the batch reactor tests showed that near complete removals of IPA under both UV (with 20 min at 10 w) and visible light (within 60 min at 10 w) sources were achieved with the N-doped TiO 2 photocatalysts. Toluene removal under visible light source for the N-doped TiO 2 was compared to that of commercial anatase Ti0 2 (ST-01 and P-25). Toluene concentration remained almost constant for the P-25 commercial photocatalyst, while it slightly decreased for the ST-01 photocatalyst. The decrease in the toluene concentration was most notable for the N-doped photocatalyst. This indicates that the N-doped photocatalyst produced in this study has a better toluene removal rate than the commercially available photocatalysts have in the visible light range. The toluene removal efficiency is not very good for a continuous flow photocatalytic reactor. The residence time of 2.35 min in a continuous flow reactor was too short for effective removal of toluene vapors. This is an abstract of a paper presented at the 98th AWMA Annual Conference and Exhibition (Minneapolis, MN 6/21-24/2005).

Original languageEnglish
Title of host publicationProceedings of the Air and Waste Management Association's Annual Conference and Exhibition, AWMA
StatePublished - 1 Dec 2005
EventAir and Waste Management Association's - 98th annual Conference and Exhibition - Minneapolis, MN, United States
Duration: 21 Jun 200524 Jun 2005

Publication series

NameProceedings of the Air and Waste Management Association's Annual Conference and Exhibition, AWMA
Volume2005
ISSN (Print)1052-6102

Conference

ConferenceAir and Waste Management Association's - 98th annual Conference and Exhibition
CountryUnited States
CityMinneapolis, MN
Period21/06/0524/06/05

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