Numerical simulation of bottom oxide thickness effect on charge retention in SONOS flash memory cells

Shaw Hung Gu*, Chih Wei Hsu, Ta-Hui Wang, Wen Pin Lu, Yen Hui Joseph Ku, Chih Yuan Lu

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

56 Scopus citations

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Engineering & Materials Science

Chemical Compounds