New observation and analysis of layout dependent effects in sub-40nm multi-ring and multi-finger nmosfets for high frequency applications

Zu Cheng Li, Jyh Chyurn Guo, Jinq Min Lin

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Multi-finger (MF) and multi-ring (MR) nMOSFETs were designed and fabricated in 40nm CMOS technology to explore the layout dependent effects in key device parameters and parasitic RC responsible for RF performance. For the first time, the experimental proves the advantages of MR nMOSFETs, such as the increase of effective mobility (\mu-{\mathrm{eff}}), transconductance (\mathrm{g}-{\mathrm{m}}), and channel current (\mathrm{I}-{\mathrm{DS}}), and smaller parasitic source resistance (\mathrm{Rs}), all of which are in favor of higher speed and higher frequency. However, the undesired increase of 3-D fringing capacitances may bring a critical trade-off influencing high frequency performance. In this paper, new observation and in-depth analysis of the complicated layout dependent effects can facilitate the device layout optimization in the right direction for RF and mm-wave design and applications.

Original languageEnglish
Title of host publication2019 International Symposium on VLSI Technology, Systems and Application, VLSI-TSA 2019
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781728109428
DOIs
StatePublished - Apr 2019
Event2019 International Symposium on VLSI Technology, Systems and Application, VLSI-TSA 2019 - Hsinchu, Taiwan
Duration: 22 Apr 201925 Apr 2019

Publication series

Name2019 International Symposium on VLSI Technology, Systems and Application, VLSI-TSA 2019

Conference

Conference2019 International Symposium on VLSI Technology, Systems and Application, VLSI-TSA 2019
CountryTaiwan
CityHsinchu
Period22/04/1925/04/19

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