NEW METHOD OF MEASURING DIFFUSION LENGTH AND SURFACE RECOMBINATION VELOCITY.

Y. S. Kim*, C. I. Drowley, Chen-Ming Hu

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

2 Scopus citations

Abstract

In this method, chopped light that may be broadband and of unknown but constant intensity is incident from the bulk side of the test cell. The photocurrent, I is measured as a function of the effective bulk thickness of the cell, which is varied by varying the junction reverse bias. The diffusion length and the surface recombination velocity of the bulk material can be deduced from the data directly - without curve fitting. The effective surface recombination velocity at an oxidized silicon surface can be varied by applying a bias voltage to a transparent gate electrode. The recombination velocity can exhibit a maximum when the surface is depleted.

Original languageEnglish
Pages (from-to)596-600
Number of pages5
JournalConference Record of the IEEE Photovoltaic Specialists Conference
StatePublished - 1 Jan 1980
EventConf Rec IEEE Photovoltaic Spec Conf 14th - San Diego, CA, USA
Duration: 7 Jan 198010 Jan 1980

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