@inproceedings{32f32e1e51d74779b2913434c750b7ee,
title = "Nanometer-scale patterning on titanium thin film with local oxidation of scanning probe microscope",
abstract = "Nanometer-scale oxidized patterns were fabricated on titanium (Ti) films deposited on silicon wafer using an atomic force microscope (AFM) based field-induced oxidation process. Titanium surfaces can be oxidized at room temperature under ambient conditions with the tip of an atomic force microscope when applying a negative bias voltage between surface and tip. We determined that the size of the oxide patterns was dependent on tip-bias voltages, scanning speed, and relative humidity. We found that the attainable oxide features of titanium patterns were improved by increasing the scanning speed, tip-bias voltage and also by lowering the relative humidity. Fabrication of nanometer-scale structures on the Ti-metal film by AFM-based field-induced oxidation and subsequent chemical wet etching of the titanium in a dilute hydrofluoric acid (HF) was demonstrated. Patterns of Ti lines below 100 nm in width were successfully fabricated by the above-described method.",
keywords = "Atomic force microscopy, Atomic layer deposition, Humidity, Oxidation, Probes, Semiconductor films, Silicon, Titanium, Transistors, Voltage",
author = "Jeng-Tzong Sheu and Yeh, {S. P.} and Wu, {C. H.} and You, {K. S.}",
year = "2002",
month = jan,
day = "1",
doi = "10.1109/NANO.2002.1032266",
language = "English",
series = "Proceedings of the IEEE Conference on Nanotechnology",
publisher = "IEEE Computer Society",
pages = "363--367",
booktitle = "Proceedings of the 2002 2nd IEEE Conference on Nanotechnology, IEEE-NANO 2002",
address = "United States",
note = "null ; Conference date: 26-08-2002 Through 28-08-2002",
}