Polymerizable nematic liquid crystal (LC) was applied as resist for our newly developed nanoimprinting lithography process. The LC resist was self-aligned during imprinting process at very low impriting pressure, 1.5 bar and the patterned area was able to achieve 4×4 cm2. The optical anisotropic was verified through polarized optical microscopy (POM). The various thickness of LC resist was evaluated and compared alignment ability with polyimide, and isotropic resists. The micro-grated LC films prepared by this novel method offer new applications for liquid crystal as alignment layer within LC cells as well as preparation of optical anisotropic films.
|Number of pages||3|
|Journal||Digest of Technical Papers - SID International Symposium|
|State||Published - 1 Dec 2006|
|Event||44th International Symposium, Seminar, and Exhibition, SID 2006 - San Francisco, CA, United States|
Duration: 4 Jun 2006 → 9 Jun 2006