Nanoimprinting lithography as novel tool inducing self-aligned liquid crystals for alignment layer

Huang-Ming Chen*, Chih Ho Chiu, Hui Lung Kuo, Pin G. Chen, Chun Hsiang Wen, Yi Chun Liu

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

1 Scopus citations

Abstract

Polymerizable nematic liquid crystal (LC) was applied as resist for our newly developed nanoimprinting lithography process. The LC resist was self-aligned during imprinting process at very low impriting pressure, 1.5 bar and the patterned area was able to achieve 4×4 cm2. The optical anisotropic was verified through polarized optical microscopy (POM). The various thickness of LC resist was evaluated and compared alignment ability with polyimide, and isotropic resists. The micro-grated LC films prepared by this novel method offer new applications for liquid crystal as alignment layer within LC cells as well as preparation of optical anisotropic films.

Original languageEnglish
Pages (from-to)1265-1267
Number of pages3
JournalDigest of Technical Papers - SID International Symposium
Volume37
Issue number1
DOIs
StatePublished - 1 Dec 2006
Event44th International Symposium, Seminar, and Exhibition, SID 2006 - San Francisco, CA, United States
Duration: 4 Jun 20069 Jun 2006

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