Nanogrids and beehive-like nanostructures formed by plasma etching the self-organized SiGe Islands

Yuan Ming Chang, Sheng Rui Jian*, Jenh-Yih Juang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

7 Scopus citations

Abstract

A lithography-free method for fabricating the nanogrids and quasi-beehive nanostructures on Si substrates is developed. It combines sequential treatments of thermal annealing with reactive ion etching (RIE) on SiGe thin films grown on (100)-Si substrates. The SiGe thin films deposited by ultrahigh vacuum chemical vapor deposition form self-assembled nanoislands via the strain-induced surface roughening (Asaro-Tiller-Grinfeld instability) during thermal annealing, which, in turn, serve as patterned sacrifice regions for subsequent RIE process carried out for fabricating nanogrids and beehive-like nanostructures on Si substrates. The scanning electron microscopy and atomic force microscopy observations confirmed that the resultant pattern of the obtained structures can be manipulated by tuning the treatment conditions, suggesting an interesting alternative route of producing self-organized nanostructures.

Original languageEnglish
Pages (from-to)1456-1463
Number of pages8
JournalNanoscale Research Letters
Volume5
Issue number9
DOIs
StatePublished - 8 Jun 2010

Keywords

  • AFM
  • High-resolution reciprocal space mapping
  • SEM
  • SiGe
  • TEM

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