Nanogap fabrication on palladium electrodes for field emission display applications

Chih Hao Tsai*, Kuan Jung Chen, Fu-Ming Pan, Hsiang Yu Lo, Yiming Li, Mei Liu, Chi Neng Mo

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

10 Scopus citations

Abstract

We have used focused ion beam (FIB) to produce nanogaps on palladium thin film line electrodes. The two facing cross-sections of the as-prepared nanogap were smooth and exhibited a large turn-on voltage for electron field emission depending on the separation of the gap. Hydrogen plasma treatment was used to increase the edge roughness of the nanogap, and thereby dramatically improve the field emission characteristics. For a gap with a separation of 90 nm, the turn-on voltage reduced to 50 V from 175 V after the hydrogen plasma treatment.

Original languageEnglish
Pages (from-to)583-585
Number of pages3
JournalDigest of Technical Papers - SID International Symposium
Volume38
Issue number1
DOIs
StatePublished - 1 Jan 2007
Event2007 SID International Symposium - Long Beach, CA, United States
Duration: 23 May 200725 May 2007

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