The nanofabrication of photonic crystal (PC) membrane defect lasers was done. With a sequential process of ion beam etching, reactive ion etching, and electron cyclotron resonance etching, the thin membrane PC defects structures were formed by transferring an electron-beam lithographically defined lattice pattern into an epitaxial layer structure. Wet chemical etching using a 4:1 mixture of HCl and H 2 O was used for the formation of a V-shaped undercut channel to create the suspended membrane.
|Number of pages||4|
|Journal||Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures|
|State||Published - 1 Mar 2002|