MULTIPHOTON IONIZATION MASS SPECTROMETRY AS A MECHANISTIC PROBE OF CHEMICAL VAPOR DEPOSITION.

D. W. Squire*, C. S. Dulcey, Ming-Chang Lin

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Scopus citations

Abstract

The low pressure pyrolysis of alkylmetals on conducting, semiconducting and non-conducting surfaces was studied using multiphoton and electron ionization analysis. No products of surface radical recombination (such as CH//4 and C//2H//6) could be seen under the conditions employed. The activation energy for gas phase methyl radical production is 30 kcal/mol for trimethylgallium compared with 13 plus or minus 2 kcal/mol observed for trimethylaluminum decomposition. A deposition mechanism is proposed.

Original languageEnglish
Title of host publicationLIA (Laser Institute of America)
PublisherLaser Inst of America
Pages148-151
Number of pages4
ISBN (Print)0912035293
DOIs
StatePublished - 1 Dec 1985

Publication series

NameLIA (Laser Institute of America)
Volume49

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    Squire, D. W., Dulcey, C. S., & Lin, M-C. (1985). MULTIPHOTON IONIZATION MASS SPECTROMETRY AS A MECHANISTIC PROBE OF CHEMICAL VAPOR DEPOSITION. In LIA (Laser Institute of America) (pp. 148-151). (LIA (Laser Institute of America); Vol. 49). Laser Inst of America. https://doi.org/10.2351/1.5059594