In this work, MOSFETs with gate oxides between 9 to 13 A have been fabricated and its behavior analyzed. An improved methodology of extracting gate oxide thickness from the MOSFET gate currents in the accumulation regime is proposed. Experimental evidence for mobility reduction mechanism, namely Remote Charge Scattering has been presented. The mobility was found to be degraded because of scattering by ionized impurities in the poly-gate.
|Number of pages||4|
|Journal||Technical Digest - International Electron Devices Meeting|
|State||Published - 1 Dec 1999|
|Event||1999 IEEE International Devices Meeting (IEDM) - Washington, DC, USA|
Duration: 5 Dec 1999 → 8 Dec 1999