Monophasic TiO 2 films deposited on SrTiO 3(100) by pulsed laser ablation

C. C. Hsieh*, Kaung-Hsiung Wu, Jenh-Yih Juang, T. M. Uen, Jiunn-Yuan Lin, Y. S. Gou

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

35 Scopus citations

Abstract

Single phase TiO 2 thin films, of either rutile or anatase structure, have been prepared on SrTiO 3(STO)(100) substrates by in situ pulsed laser deposition (PLD). Thermodynamically unfavorable, for films deposited on STO(100) substrate directly, pure anatase TiO 2(00l) films were formed even when a rutile TiO 2(110) substrate was used as a target. On the other hand, pure rutile TiO 2(110) films were obtained by oxidizing PLD TiN films in-situ at temperatures higher than 700°C. The optimized deposition conditions for preparing TiN and TiO 2 films were reported. The crystalline structure, surface morphology, and electronic structure of these films were examined. A mechanism of the process of film formation is also proposed.

Original languageEnglish
Pages (from-to)2518-2523
Number of pages6
JournalJournal of Applied Physics
Volume92
Issue number5
DOIs
StatePublished - 1 Sep 2002

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