Modified double EWMA approach for mixed product run-to-run CMP process control

An-Chen Lee*, Tzu Wei Kuo, Zeng Lien Lee

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

Advanced process control (APC) has been recognized as a proper tool for maximizing profitability of semiconductor manufacturing facilities by improving efficiency and product quality. Run-to-run (RtR) process control with good quality and reliable performance for APC applications are most applicable. Chemical mechanical planarization (CMP) is part of critical processing module in semiconductor manufacturing. This paper proposes a new RtR control scheme, modified double EWMA controller (m-dEWMA), which is adaptive to the mixed product CMP processes. The m-dEWMA controller combined thread dEWMA with the drift compensation scheme to deal with the drift and shift disturbances caused by tool and products, respectively. Comparing recently mixed product control schemes: threaded EWMA controller, JADE control and threaded prediction correction controller (threaded PCC), the simulation results show that the m-dEWMA has better control performance than other controllers. The experiment results revealed that the m-dEWMA controller improves the wafer uniformity significantly in mixed product CMP process.

Original languageEnglish
Title of host publicationAdvanced Manufacturing Technology
Pages2504-2511
Number of pages8
DOIs
StatePublished - 26 Sep 2011
Event2011 International Conference on Advanced Design and Manufacturing Engineering, ADME 2011 - Guangzhou, China
Duration: 16 Sep 201118 Sep 2011

Publication series

NameAdvanced Materials Research
Volume314-316
ISSN (Print)1022-6680

Conference

Conference2011 International Conference on Advanced Design and Manufacturing Engineering, ADME 2011
CountryChina
CityGuangzhou
Period16/09/1118/09/11

Keywords

  • Advanced process control
  • Chemical-mechanical planarization (CMP)
  • DEWMA controller
  • Mixed product
  • Run-to-run
  • Uniformity

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